Paper
1 October 2013 Looking for simple engineering solutions in DFM patents
Author Affiliations +
Proceedings Volume 8886, 29th European Mask and Lithography Conference; 88860M (2013) https://doi.org/10.1117/12.2028831
Event: 29th European Mask and Lithography Conference, 2013, Dresden, Germany
Abstract
Progress in IC technologies is usually based on costly improvements of process equipment. An alternative path is to look into opportunities based on the engineering disclosures, which can have a lot of potential in the Design-for- Manufacturing domain. This paper discusses six examples of such disclosures, filed in the 2010-2012 timeframe.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Artur Balasinski "Looking for simple engineering solutions in DFM patents", Proc. SPIE 8886, 29th European Mask and Lithography Conference, 88860M (1 October 2013); https://doi.org/10.1117/12.2028831
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KEYWORDS
Data modeling

Optical proximity correction

Etching

Lithography

Design for manufacturing

Semiconducting wafers

Calibration

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