Vector analysis of two-dimensional Ronchi grating in the metrology system

Zhengpeng Yao; Tingwen Xing

doi:10.1117/12.2034499

23 August 2013 Vector analysis of two-dimensional Ronchi grating in the metrology system

Zhengpeng Yao, Tingwen Xing

Proceedings Volume 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications; 89110J (2013) https://doi.org/10.1117/12.2034499
Event: ISPDI 2013 - Fifth International Symposium on Photoelectronic Detection and Imaging, 2013, Beijing, China

Abstract

The semiconductor industry is aggressively pushed to produce smaller and smaller feature size from their existing base of lithography system, wavefront aberration should be derived by comparing ideal and real wavefronts at the wafer plane of a high resolution lithography system. In modern optical metrology, shearing interferometer is used more and more widely. We proposed a two-dimensional shearing interferometer, using two-dimensional Ronchi grating instead of a traditional one-dimensional grating, which can realize multidirectional and multidimensional shear. In order to further improve the detection accuracy of metrology system, vector diffraction theory is introduced. By comparing the vector and scalar light field, finally we can get the impact of vector light field on the performance of the shearing interferometer. This is for us to further improve the accuracy of detection system to provide rich information, which is crucial for the development of the lithography process.

Citation Download Citation

Zhengpeng Yao and Tingwen Xing "Vector analysis of two-dimensional Ronchi grating in the metrology system", Proc. SPIE 8911, International Symposium on Photoelectronic Detection and Imaging 2013: Micro/Nano Optical Imaging Technologies and Applications, 89110J (23 August 2013); https://doi.org/10.1117/12.2034499

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