Ion-beam and plasma etching of a conical-pores photonic crystal for thin-film solar cell

Gediminas Gervinskas; Lorenzo Rosa; Saulius Juodkazis

doi:10.1117/12.2033762

7 December 2013 Ion-beam and plasma etching of a conical-pores photonic crystal for thin-film solar cell

Gediminas Gervinskas, Lorenzo Rosa, Saulius Juodkazis

Proceedings Volume 8923, Micro/Nano Materials, Devices, and Systems; 89232G (2013) https://doi.org/10.1117/12.2033762
Event: SPIE Micro+Nano Materials, Devices, and Applications, 2013, Melbourne, Victoria, Australia

Abstract

Conical holes bored in the active layer of a thin-film silicon solar cell by ion-beam lithography (IBL) show increase of effective optical absorption in the underlying silicon active layer. The optical properties are numerically simulated by the 3D finite-difference time-domain method (3D-FDTD), showing wideband increase of the UV, visible, and IR quantum efficiency. An experimental fabrication procedure is developed using IBL for high wide- area repeatability. A further optimization on the cone shapes is performed in order to make fabrication feasible with plasma etching techniques.

Citation Download Citation

Gediminas Gervinskas, Lorenzo Rosa, and Saulius Juodkazis "Ion-beam and plasma etching of a conical-pores photonic crystal for thin-film solar cell", Proc. SPIE 8923, Micro/Nano Materials, Devices, and Systems, 89232G (7 December 2013); https://doi.org/10.1117/12.2033762

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