Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold

Junwei Su; Fan Gao; Zhiyong Gu; Wen Dai; George Cernigliaro; Hongwei Sun

doi:10.1117/12.2039832

7 March 2014 Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold

Junwei Su, Fan Gao, Zhiyong Gu, Wen Dai, George Cernigliaro, Hongwei Sun

Proceedings Volume 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII; 897409 (2014) https://doi.org/10.1117/12.2039832
Event: SPIE MOEMS-MEMS, 2014, San Francisco, California, United States

Abstract

In this work, 3-D nanoscale line patterns were fabricated on SU-8 layers by Ga+ focused ion beam (FIB) lithography and used as Nanoimprint lithography (NIL) mold. Both V-shape side wall and opposing dose deficiency effect were observed and analyzed during the FIB milling process. Different beam currents were utilized to fabricate SU-8 pattern and it is found that the lower beam currents provide higher quality pattern with smooth edges and straight side walls. In addition, the impact of crosslink density of SU-8 material on the FIB milling efficiency was discussed. Both thermal and ultraviolet (UV) NIL were conducted using these line patterns to study the deformation of SU-8 mold and filling ratio of imprinting material. The experiments revealed that the imprint pressure and physic properties of imprinting material are the most critical factors in these NIL processes.

Citation Download Citation

Junwei Su, Fan Gao, Zhiyong Gu, Wen Dai, George Cernigliaro, and Hongwei Sun "Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold", Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 897409 (7 March 2014); https://doi.org/10.1117/12.2039832

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