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7 March 2014 Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits
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Abstract
We utilized a hybrid lithography technique in the fabrication of a 45 degree micro mirror coupler to be used for a 3D optical circuit. The hybrid process combines traditional mask-based lithography techniques with mask-less methods. The result is a CMOS compatible process that can be used for fabrication of integrated micro-optics.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, and Yuzuru Takashima "Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits", Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 89740C (7 March 2014); https://doi.org/10.1117/12.2045234
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