Particle control challenges in process chemicals and ultra-pure water for sub-10nm technology nodes

Abbas Rastegar; Martin Samayoa; Matthew House; Hüseyin Kurtuldu; Sang-Kee Eah; Lauren Morse; Jenah Harris-Jones

doi:10.1117/12.2048080

17 April 2014 Particle control challenges in process chemicals and ultra-pure water for sub-10nm technology nodes

Abbas Rastegar, Martin Samayoa, Matthew House, Hüseyin Kurtuldu, Sang-Kee Eah, Lauren Morse, Jenah Harris-Jones

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90480P (2014) https://doi.org/10.1117/12.2048080
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Particle contamination in ultra-pure water (UPW) and chemicals will eventually end up on the surface of a wafer and may result in killer defects. To improve the semiconductor processing yield in sub-10 nm half pitch nodes, it is necessary to control particle defectivity. In a systematic study of all major techniques for particle detection, counting, and sizing in solutions, we have shown that there is a gap in the required particle metrology which needs to be addressed by the industry. To reduce particles in solutions and improve filter retention for sub-10 nm particles with very low densities (<10 particles/mL), liquid particle counters that are able to detect small particles at low densities are required. Non-volatile residues in chemicals and UPW can result in nanoparticles. Measuring absolute non-volatile residues in UPW with concentrations in the ppb range is a challenge. However, by using energy-dispersive spectroscopy (EDS) analysis through transmission electron microscopy (TEM) of non-volatile residues we found silica both in dissolved and colloidal particle form which is present in one of the cleanest UPW that we tested. A particle capture/release technique was developed at SEMATECH which is able to collect particles from UPW and release them in a controlled manner. Using this system we showed sub-10 nm particles are present in UPW. In addition to colloidal silica, agglomerated carbon containing particles were also found in UPW.

Citation Download Citation

Abbas Rastegar, Martin Samayoa, Matthew House, Hüseyin Kurtuldu, Sang-Kee Eah, Lauren Morse, and Jenah Harris-Jones "Particle control challenges in process chemicals and ultra-pure water for sub-10nm technology nodes", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480P (17 April 2014); https://doi.org/10.1117/12.2048080

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