Paper
17 April 2014 Zernike phase contrast microscope for EUV mask inspection
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Abstract
In this paper, we address a new inspection method which provides in-focus inspection capability and higher defect sensitivity compared with conventional mask inspection methods. In the Zernike phase contrast microscope, an added phase shift to background wave combines with the phase of bump and pit defects to achieve higher contrast at focus. If we use a centralized apodization to half the lens radius to further reduce the intensity of the phase-shifted background wave, the signal strength can be improved up to 6-fold of its original value. Simulation results further show that this apodization for a typical EUV mask power spectral density results in the noise decreasing in absolute level similar to the clear field reference signal. Thus large improvements in signal to noise ratios are possible with the Zernike phase contrast microscope type systems for EUV mask inspection applications.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yow-Gwo Wang, Ryan Miyakawa, Andrew Neureuther, and Patrick Naulleau "Zernike phase contrast microscope for EUV mask inspection", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904810 (17 April 2014); https://doi.org/10.1117/12.2048180
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Cited by 7 scholarly publications and 1 patent.
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KEYWORDS
Phase contrast

Phase shifts

Apodization

Signal to noise ratio

Extreme ultraviolet

Inspection

Microscopes

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