Projection optics for EUVL micro-field exposure tools with 0.5 NA

Holger Glatzel; Dominic Ashworth; Dan Bajuk; Matt Bjork; Mark Bremer; Mark Cordier; Kevin Cummings; Luc Girard; Michael Goldstein; Eric Gullikson; Samuel Hardy; Russ Hudyma; James Kennon; Robert Kestner; Lou Marchetti; Keyvan Nouri; Patrick Naulleau; Daniel Pierce; Regina Soufli; Eberhard Spiller; Yogesh Verma

doi:10.1117/12.2048643

17 April 2014 Projection optics for EUVL micro-field exposure tools with 0.5 NA

Holger Glatzel, Dominic Ashworth, Dan Bajuk, Matt Bjork, Mark Bremer, Mark Cordier, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Samuel Hardy, Russ Hudyma, James Kennon, Robert Kestner, Lou Marchetti, Keyvan Nouri, Patrick Naulleau, Daniel Pierce, Regina Soufli, Eberhard Spiller, Yogesh Verma

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90481K (2014) https://doi.org/10.1117/12.2048643
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

In last year’s report, we discussed the design and requirements of the optical projection module (Projection Optics Box [POB]) for the 0.5-NA Micro-field Exposure Tool (MET5) and the resulting challenges. Over the course of this past year, we have completed and fully qualified the metrology of individual mirrors. All surface figure errors have been measured over seven orders of magnitude with spatial periods ranging from the full clear aperture down to 10 nm. The reproducibility of the full aperture tests measures 16 pm RMS for the M1 test and 17 pm for the M2 test with a target of 30 pm for both tests. Furthermore, we achieved excellent results on scatter and flare: For scatter, both mirrors perform about a factor of two below specification. For flare, the larger M2 mirror performs well within and the smaller M1 mirror about a factor of two below specification. In addition, we have developed processes for correcting surface figure errors for both mirrors and have successfully demonstrated high-reflectivity coatings on pathfinder mirrors. Further, we have achieved significant goals with respect to the design, assembly, metrology and alignment of the projection module. This paper reviews this progress and describes the next step in the ambitious MET5 POB development program.

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Holger Glatzel, Dominic Ashworth, Dan Bajuk, Matt Bjork, Mark Bremer, Mark Cordier, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Samuel Hardy, Russ Hudyma, James Kennon, Robert Kestner, Lou Marchetti, Keyvan Nouri, Patrick Naulleau, Daniel Pierce, Regina Soufli, Eberhard Spiller, and Yogesh Verma "Projection optics for EUVL micro-field exposure tools with 0.5 NA", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481K (17 April 2014); https://doi.org/10.1117/12.2048643

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