A full-chip DSA correction framework

Wei-Long Wang; Azat Latypov; Yi Zou; Tamer Coskun

doi:10.1117/12.2045982

28 March 2014 A full-chip DSA correction framework

Wei-Long Wang, Azat Latypov, Yi Zou, Tamer Coskun

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90491J (2014) https://doi.org/10.1117/12.2045982
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The graphoepitaxy DSA process relies on lithographically created confinement wells to perform directed self-assembly in the thin film of the block copolymer. These self-assembled patterns are then etch transferred into the substrate. The conventional DUV immersion or EUV lithography is still required to print these confinement wells, and the lithographic patterning residual errors propagate to the final patterns created by DSA process. DSA proximity correction (PC), in addition to OPC, is essential to obtain accurate confinement well shapes that resolve the final DSA patterns precisely. In this study, we proposed a novel correction flow that integrates our co-optimization algorithms, rigorous 2-D DSA simulation engine, and OPC tool. This flow enables us to optimize our process and integration as well as provides a guidance to design optimization. We also showed that novel RET techniques such as DSA-Aware assist feature generation can be used to improve the process window. The feasibility of our DSA correction framework on large layout with promising correction accuracy has been demonstrated. A robust and efficient correction algorithm is also determined by rigorous verification studies. We also explored how the knowledge of DSA natural pitches and lithography printing constraints provide a good guidance to establish DSA-Friendly designs. Finally application of our DSA full-chip computational correction framework to several real designs of contact-like holes is discussed. We also summarize the challenges associated with computational DSA technology.

Citation Download Citation

Wei-Long Wang, Azat Latypov, Yi Zou, and Tamer Coskun "A full-chip DSA correction framework", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491J (28 March 2014); https://doi.org/10.1117/12.2045982

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available