Correction of EB-induced shrinkage in contour measurements

Takeyoshi Ohashi; Shoji Hotta; Atsuko Yamaguchi; Junichi Tanaka; Hiroki Kawada

doi:10.1117/12.2047563

2 April 2014 Correction of EB-induced shrinkage in contour measurements

Takeyoshi Ohashi, Shoji Hotta, Atsuko Yamaguchi, Junichi Tanaka, Hiroki Kawada

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90500J (2014) https://doi.org/10.1117/12.2047563
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

We have proposed a new method for correcting electron beam (EB)-induced photoresist shrinkage in two-dimensional pattern contours extracted from a scanning electron microscope image. This method restores the original shrinkage-free contour from the experimentally determined “shrunk contour”, based on a shrinkage model which takes into account of the elastic nature of the shrinkage phenomena caused by the photoresist-volume reduction. Verification of this shrinkage model was demonstrated by using ArF resist patterns as follows. First, the model was calibrated with the shrinkage data of several line patters with different linewidth prior to the contour correction. Next, the amount of shrinkage of elbow patterns was measured by comparing its contours obtained with small and sufficiently large EB dosages. It was found that the shrinkage of the inner edge of the elbow corner was smaller than that of the outer edge, which can be interpreted as a result of the elastic deformation. Finally, validity of shrinkage correction was examined. The model calculation correctly reproduced the observed shrinkage including its dependence on the location in the pattern. The restored contour showed a good consistency with the experimental results and the total root-mean-square error of the shrinkage correction was 0.5 nm. This result confirmed that our shrinkage model adequately describes the shrinkage of two dimensional patterns. Consequently, proposed shrinkage correction method is expected to improve the accuracy of contour measurements by a critical dimension-scanning electron microscope.

Citation Download Citation

Takeyoshi Ohashi, Shoji Hotta, Atsuko Yamaguchi, Junichi Tanaka, and Hiroki Kawada "Correction of EB-induced shrinkage in contour measurements", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90500J (2 April 2014); https://doi.org/10.1117/12.2047563

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