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2 April 2014 High-precision self-tool CD matching with focus-target assist pattern by computational ways
Sung-Man Kim, Hyun-Chul Kim, Jung-Woo Lee, Young-Seok Kim, Yong-Ho Kim, Sung-Keun Won, Sung-il (Andrew) Kim, Ki-Yeop (Chris) Park, Chang-Hoon Ryu, Qi-Tong Fan, Ki-Ho Baik
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Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 90502X (2014) https://doi.org/10.1117/12.2047272
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States
Abstract
As design rules of advance devices shrink down, not only process-window budget of lithography process is getting tighter, but also CD control to target is more important especially for multiple tool process environment in HVM (High Volume Manufacturing). The tool induced CD bias or CD difference between tools are derived by minute amount of residual imaging parameters even though with strict control in system. The tool to tool CD mismatch is able to be reduced to nanometer or sub-nanometer scale for critical features of concern by using released tools such as LithoTuner PMFCTM (Pattern Matcher Full Chip). During the matching process, tunable imaging parameters such as pupil shape and stage tilt can be used as matching knobs. In this paper, CD mismatch due to film stack change on same exposure tool was studied to check feasibility of PMFC application. Also, CD variation and its impact on CD mismatch by focus error as amount of intrinsic system was investigated as well. By considering the focus impact on CD proximity bias via simple mathematical ways, the CD matching process could be more accurately performed and verified.
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Sung-Man Kim, Hyun-Chul Kim, Jung-Woo Lee, Young-Seok Kim, Yong-Ho Kim, Sung-Keun Won, Sung-il (Andrew) Kim, Ki-Yeop (Chris) Park, Chang-Hoon Ryu, Qi-Tong Fan, and Ki-Ho Baik "High-precision self-tool CD matching with focus-target assist pattern by computational ways", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502X (2 April 2014); https://doi.org/10.1117/12.2047272
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KEYWORDS
Critical dimension metrology
Semiconducting wafers
Control systems
Photoresist processing
Scanners
Finite element methods
Image processing
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