Manufacturability improvements in EUV resist processing toward NXE:3300 processing

Yuhei Kuwahara; Koichi Matsunaga; Takeshi Shimoaoki; Shinichiro Kawakami; Kathleen Nafus; Philippe Foubert; Anne-Marie Goethals; Satoru Shimura

doi:10.1117/12.2046254

27 March 2014 Manufacturability improvements in EUV resist processing toward NXE:3300 processing

Yuhei Kuwahara, Koichi Matsunaga, Takeshi Shimoaoki, Shinichiro Kawakami, Kathleen Nafus, Philippe Foubert, Anne-Marie Goethals, Satoru Shimura

Author Affiliations +

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 905108 (2014) https://doi.org/10.1117/12.2046254
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

As the design rule of semiconductor process gets finer, extreme ultraviolet lithography (EUVL) technology is aggressively studied as a process for 22nm half pitch and beyond. At present, the studies for EUV focus on manufacturability. It requires fine resolution, uniform, smooth patterns and low defectivity, not only after lithography but also after the etch process. In the first half of 2013, a CLEAN TRACK^TM LITHIUS Pro^TMZ-EUV was installed at imec for POR development in preparation of the ASML NXE:3300. This next generation coating/developing system is equipped with state of the art defect reduction technology. This tool with advanced functions can achieve low defect levels. This paper reports on the progress towards manufacturing defectivity levels and latest optimizations towards the NXE:3300 POR for both lines/spaces and contact holes at imec.

Citation Download Citation

Yuhei Kuwahara, Koichi Matsunaga, Takeshi Shimoaoki, Shinichiro Kawakami, Kathleen Nafus, Philippe Foubert, Anne-Marie Goethals, and Satoru Shimura "Manufacturability improvements in EUV resist processing toward NXE:3300 processing", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905108 (27 March 2014); https://doi.org/10.1117/12.2046254

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available