Chiral nanomaterial fabrication by means of on-edge lithography

Kay Dietrich; Dennis Lehr; Oliver Puffky; Ernst-Bernhard Kley; Andreas Tünnermann

doi:10.1117/12.2046214

27 March 2014 Chiral nanomaterial fabrication by means of on-edge lithography

Kay Dietrich, Dennis Lehr, Oliver Puffky, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90510D (2014) https://doi.org/10.1117/12.2046214
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

We present an approach named on-edge lithography, where chiral shaped pattern are yield through the combination of electron beam lithography in variable shape or cell projection mode and shadow evaporation. On one hand, we describe the process and reveal advantages when opposed to other common nano fabrication techniques. On the other hand, we also figure out challenges for successful technological application. Finally we demonstrate the useability of the process by revealing SEM pictures of a couple of realized chiral nanostructures. In order to evaluate the process we further present optical measurements. We find peak values of circular dichroism of 44% at 420 THz (715 nm). The process is applicable on large scale and to the fullest compatible with other nano-lithographic tools e.g. nanoimprint replication techniques, thus pushing chiral nanomaterial fabrication towards highest efficiency.

Citation Download Citation

Kay Dietrich, Dennis Lehr, Oliver Puffky, Ernst-Bernhard Kley, and Andreas Tünnermann "Chiral nanomaterial fabrication by means of on-edge lithography", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510D (27 March 2014); https://doi.org/10.1117/12.2046214

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