Nanopatterning with tailored molecules

Florian Wieberger; Tristan Kolb; Christian Neuber; Christopher K. Ober; Hans-Werner Schmidt

doi:10.1117/12.2047109

27 March 2014 Nanopatterning with tailored molecules

Florian Wieberger, Tristan Kolb, Christian Neuber, Christopher K. Ober, Hans-Werner Schmidt

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90510G (2014) https://doi.org/10.1117/12.2047109
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Star block copolymer synthesis was performed in a controlled fashion by an in-situ core first ATRP route. The obtained resist materials on the basis of industrial used monomers with tailored star block copolymer architecture were systematically characterized and patterned. In dissolution investigations an excellent dissolution contrast between exposed and unexposed state was identified for this new resist material type. Additionally, the materials show an excellent sensitivity, which surpass the reference linear copolymer by a factor of eight. By a combinatorial resist optimization realized high resolution features are presented. Finally, preliminary results utilizing a further improved resist material design are shown.

Citation Download Citation

Florian Wieberger, Tristan Kolb, Christian Neuber, Christopher K. Ober, and Hans-Werner Schmidt "Nanopatterning with tailored molecules", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510G (27 March 2014); https://doi.org/10.1117/12.2047109

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