Adsorption characteristics of lithography filters in various solvents using application-specific ratings

Toru Umeda; Shuichi Tsuzuki

doi:10.1117/12.2046588

27 March 2014 Adsorption characteristics of lithography filters in various solvents using application-specific ratings

Toru Umeda, Shuichi Tsuzuki

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90511G (2014) https://doi.org/10.1117/12.2046588
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

It is known that DUV resist filtration using Nylon 6,6 membrane significantly reduces microbridge defects. Previous work has described a method to determine an adsorption performance index using modified metal nanoparticles, which simulate interactions with microbridge defect precursors. In this paper, the effects of filter grade, filter material, and solvent type on adsorptive retention are explored. The adsorption rate in Nylon 6,6 40 nm filter was observed to be greater in both lower-LogPow and lower-viscosity solvents, possibly providing a direction for improved filtration performance based on the solvent properties. The complementary adsorption kinetics parameters give a more accurate suggestion for the filter performance in lithography applications combined with the conventional sieving filter ratings.

Citation Download Citation

Toru Umeda and Shuichi Tsuzuki "Adsorption characteristics of lithography filters in various solvents using application-specific ratings", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511G (27 March 2014); https://doi.org/10.1117/12.2046588

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