Modeling acid transport in chemically amplified resist films

Abhijit A. Patil; Manolis Doxastakis; Gila E. Stein

doi:10.1117/12.2046473

27 March 2014 Modeling acid transport in chemically amplified resist films

Abhijit A. Patil, Manolis Doxastakis, Gila E. Stein

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90511M (2014) https://doi.org/10.1117/12.2046473
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The acid-catalyzed deprotection of glassy poly(4-hydroxystyrene-co-tert butyl acrylate) ﬁlms was studied with infrared absorbance spectroscopy and stochastic simulations. Experimental data were interpreted with a simple description of subdiﬀusive acid transport coupled to second-order acid loss. This model predicts key attributes of observed deprotection rates, such as fast reaction at short times, slow reaction at long times, and a non-linear dependence on acid loading. The degree of anomalous character is reduced by increasing the post-exposure bake temperature or adding plasticizing agents to the polymer resin. These ﬁndings indicate that the acid mobility and overall deprotection kinetics are coupled to glassy matrix dynamics. Furthermore, the acid diﬀusion lengths were calculated from the anomalous transport model and compared with nanopattern line widths. The consistent scaling between experiments and simulations suggests that the anomalous diﬀusion model could be further developed into a predictive lithography tool.

Citation Download Citation

Abhijit A. Patil, Manolis Doxastakis, and Gila E. Stein "Modeling acid transport in chemically amplified resist films", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511M (27 March 2014); https://doi.org/10.1117/12.2046473

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