Model-based OPC using the MEEF matrix II

Junjiang Lei; Le Hong; George Lippincott; James Word

doi:10.1117/12.2046635

31 March 2014 Model-based OPC using the MEEF matrix II

Junjiang Lei, Le Hong, George Lippincott, James Word

Proceedings Volume 9052, Optical Microlithography XXVII; 90520N (2014) https://doi.org/10.1117/12.2046635
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

In the traditional OPC (Optical Proximity Correction) procedure, edges in a layout are broken into fragments and each fragment is iteratively adjusted by multiplying its EPE (Edge Placement Error) with a carefully selected or calculated feedback. However, the ever-shrinking technology nodes in recent years bring stronger fragment to fragment interaction. The feedback tuning approach driven by a single fragment EPE is no longer sufficient to achieve good pattern fidelity with reasonable turn-around-time. Various novel techniques such as matrix OPC [1, 2] have been developed in the past to incorporate the influence of neighboring fragments into each fragment’s movement. Here we introduce a neighboraware feedback controller for full chip level OPC applications, following the concept and algorithms of the matrix OPC that were laid out in Cobb and Granik’s work [1]. We present experimental results and discuss the benefits and challenges of the proposed feedback controller.

Citation Download Citation

Junjiang Lei, Le Hong, George Lippincott, and James Word "Model-based OPC using the MEEF matrix II", Proc. SPIE 9052, Optical Microlithography XXVII, 90520N (31 March 2014); https://doi.org/10.1117/12.2046635

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