Novel wafer stepper with violet LED light source

Yung-Chiang Ting; Shyi-Long Shy

doi:10.1117/12.2045738

31 March 2014 Novel wafer stepper with violet LED light source

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 9052, Optical Microlithography XXVII; 90522G (2014) https://doi.org/10.1117/12.2045738
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Novel wafer stepper by using contact or proximity printing will be developed, using violet LED light source to replace Hg Arc. lamp or laser. Mirror, filter and condenser lens for Hg Arc. Lamp or laser and reduction lens for projection printing can be discarded. Reliability and manufacturing cost of wafer stepper can be improved. Exposure result by using IP3600 resist and wafer stepper with violet LED light source (wave-length 360nm to 410 nm) will be obtained. This novel wafer stepper can be used for 3DIC, MEMS and bio-chip lithography application by using thin and thick resist with sub-micron to 100 micron thickness.

Citation Download Citation

Yung-Chiang Ting and Shyi-Long Shy "Novel wafer stepper with violet LED light source", Proc. SPIE 9052, Optical Microlithography XXVII, 90522G (31 March 2014); https://doi.org/10.1117/12.2045738

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