Lithography yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations

Sergio Gómez; Francesc Moll; Juan Mauricio

doi:10.1117/12.2046208

28 March 2014 Lithography yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations

Sergio Gómez, Francesc Moll, Juan Mauricio

Author Affiliations +

Proceedings Volume 9053, Design-Process-Technology Co-optimization for Manufacturability VIII; 90530M (2014) https://doi.org/10.1117/12.2046208
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

A yield estimation model to evaluate the lithography distortion in a printed layout is presented. The yield model relates the probability of non-failure of a lithography hotspot with the manufacturing yield loss. We define a lithography hotspot as a pattern construct with excessive variation under lithography printing using lithography simulations. Thereby, we propose a pattern construct classifier to reduce the set of lithography simulations necessary to estimate the litho-degradation. The application of the yield model is demonstrated for different layout configurations showing that a certain degree of layout regularity improves the manufacturing yield and increases the number of good dies per wafer.

Citation Download Citation

Sergio Gómez, Francesc Moll, and Juan Mauricio "Lithography yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations", Proc. SPIE 9053, Design-Process-Technology Co-optimization for Manufacturability VIII, 90530M (28 March 2014); https://doi.org/10.1117/12.2046208

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