Model for atomic layer deposition on inner wall of rectangular pipes with large aspect ratio

Yuqing Xiong; Maojin Dong; Kun Li; Jizhou Wang; Ni Ren

doi:10.1117/12.2053143

16 December 2013 Model for atomic layer deposition on inner wall of rectangular pipes with large aspect ratio

Yuqing Xiong, Maojin Dong, Kun Li, Jizhou Wang, Ni Ren

Proceedings Volume 9068, Eighth International Conference on Thin Film Physics and Applications; 90680C (2013) https://doi.org/10.1117/12.2053143
Event: Eighth International Conference on Thin Film Physics and Applications (TFPA13), 2013, Shanghai, China

Abstract

Feasibility of thin films deposited on inner wall of rectangular pipes with length aspect ratio up to 50 by atomic layer deposition was studied, by solving kinetics equation of gas adsorption on inner wall of pipes. And the time for reactants to reach saturated adsorption in pipes was calculated. Furthermore, the process of thin film deposition by atomic layer deposition was simulated by Kinetic Monte Carlo method, and a growth model for atomic layer deposition of aluminum on inner wall of long rectangular pipes was established.

Citation Download Citation

Yuqing Xiong, Maojin Dong, Kun Li, Jizhou Wang, and Ni Ren "Model for atomic layer deposition on inner wall of rectangular pipes with large aspect ratio", Proc. SPIE 9068, Eighth International Conference on Thin Film Physics and Applications, 90680C (16 December 2013); https://doi.org/10.1117/12.2053143

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KEYWORDS

Atomic layer deposition

Adsorption

Monte Carlo methods

Aluminum

Thin films

Molecules

Thin film deposition

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