Nickel oxide and molybdenum oxide thin films for infrared imaging prepared by biased target ion-beam deposition

Yao Jin; David Saint John; Tom N. Jackson; Mark W. Horn

doi:10.1117/12.2053174

24 June 2014 Nickel oxide and molybdenum oxide thin films for infrared imaging prepared by biased target ion-beam deposition

Yao Jin, David Saint John, Tom N. Jackson, Mark W. Horn

Author Affiliations +

Proceedings Volume 9070, Infrared Technology and Applications XL; 90701S (2014) https://doi.org/10.1117/12.2053174
Event: SPIE Defense + Security, 2014, Baltimore, MD, United States

Abstract

Vanadium oxide (VO_x) thin films have been intensively used as sensing materials for microbolometers. VO_x thin films have good bolometric properties such as low resistivity, high negative temperature coefficient of resistivity (TCR) and low 1/f noise. However, the processing controllability of VO_x fabrication is difficult due to the multiple valence states of vanadium. In this study, metal oxides such as nickel oxide (NiO_x) and molybdenum oxide (MoO_x) thin films have been investigated as possible new microbolometer sensing materials with improved process controllability. Nickel oxide and molybdenum oxide thin films were prepared by reactive sputtering of nickel and molybdenum metal targets in a biased target ion beam deposition tool. In this deposition system, the Ar⁺ ion energy (typically lower than 25 eV) and the target bias voltage can be independently controlled since ions are remotely generated. A residual gas analyzer (RGA) is used to precisely control the oxygen partial pressure. A real-time spectroscopic ellipsometry is used to monitor the evolution of microstructure and properties of deposited oxides during growth and post-deposition. The properties of deposited oxide thin films depend on processing parameters. The resistivity of the NiO_x thin films is in the range of 0.5 to approximately 100 ohm-cm with a TCR from -2%/K to -3.3%/K, where the resistivity of MoO_x is between 3 and 2000 ohm-cm with TCR from -2.1%/K to -3.2%/K. We also report on the thermal stability of these deposited oxide thin films.

Citation Download Citation

Yao Jin, David Saint John, Tom N. Jackson, and Mark W. Horn "Nickel oxide and molybdenum oxide thin films for infrared imaging prepared by biased target ion-beam deposition", Proc. SPIE 9070, Infrared Technology and Applications XL, 90701S (24 June 2014); https://doi.org/10.1117/12.2053174

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available