A fabrication and characterictics of microbolometer detectors using VOx/ZnO/VOx multilayer thin film processing

Myung-Soo Han; Dae Hyeon Kim; Hang Ju Ko; Jae Chul Shin; Hyo Jin Kim; Do Gun Kim

doi:10.1117/12.2049513

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24 June 2014 A fabrication and characterictics of microbolometer detectors using VOx/ZnO/VOx multilayer thin film processing

Myung-Soo Han, Dae Hyeon Kim, Hang Ju Ko, Jae Chul Shin, Hyo Jin Kim, Do Gun Kim

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Proceedings Volume 9070, Infrared Technology and Applications XL; 90701X (2014) https://doi.org/10.1117/12.2049513
Event: SPIE Defense + Security, 2014, Baltimore, Maryland, United States

Abstract

In this work, a novel fabrication method for VOx-ZnO multilayers with mixed phase of the VO₂ and V₂O₃ through the diffusion of oxygen by annealing at low temperature is presented. A stable sandwich structure of a VOx/ZnO/VOx multilayer was deposited at room temperature, through the oxygen gas flow rate, by RF sputtering system, and the mixed phase was formed through oxygen diffusion by annealing at O₂ atmosphere. The results show that the single phase like multilayer formed by this process has a high TCR of more than -2.5%/K and low resistance of about 100 kohm at room temperature. XRD results for the as-deposited VOx/ZnO/VOx multilayer.

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Myung-Soo Han, Dae Hyeon Kim, Hang Ju Ko, Jae Chul Shin, Hyo Jin Kim, and Do Gun Kim "A fabrication and characterictics of microbolometer detectors using VOx/ZnO/VOx multilayer thin film processing", Proc. SPIE 9070, Infrared Technology and Applications XL, 90701X (24 June 2014); https://doi.org/10.1117/12.2049513

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