Paper
28 May 2014 Full-field step profile measurement with sinusoidal wavelength scanning interferometer
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Abstract
A sinusoidal wavelength scanning interferometer is proposed for 3-D profile measurement. The interference phase-shift signal generated by the sinusoidal wavelength scanning contains information of optical path difference (OPD) covering nm-mm scale structure. The interference phase-shift signal was obtained by the four-step phase shifting method. The sinusoidal wavelength shifting bandwidth of 5.7 nm with a frequency of approximately 180 Hz was performed by the Littman-Metcalf external resonator-type tunable laser with a center of 772.1 nm. The full-field step-height surface profile measurement and 3-D surface measurement were conducted by a CCD image sensor with an accuracy of few tens nm. The surface profile of gauge blocks with a step-height of up to 10 μm was successfully measured.
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Samuel Choi, Osami Sasaki, and Takamasa Suzuki "Full-field step profile measurement with sinusoidal wavelength scanning interferometer", Proc. SPIE 9110, Dimensional Optical Metrology and Inspection for Practical Applications III, 91100F (28 May 2014); https://doi.org/10.1117/12.2053539
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KEYWORDS
Interferometers

Interferometry

Charge-coupled devices

Phase shifting

Phase shifts

Avalanche photodetectors

3D metrology

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