Increase of the photosensitivity of undoped poly(methylmethacrylate) under UV radiation at 325 nm

D. Sáez-Rodríguez; K. Nielsen; O. Bang; D. J. Webb

doi:10.1117/12.2054297

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2 May 2014 Increase of the photosensitivity of undoped poly(methylmethacrylate) under UV radiation at 325 nm

D. Sáez-Rodríguez, K. Nielsen, O. Bang, D. J. Webb

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Proceedings Volume 9128, Micro-structured and Specialty Optical Fibres III; 91280P (2014) https://doi.org/10.1117/12.2054297
Event: SPIE Photonics Europe, 2014, Brussels, Belgium

Abstract

In this paper we report, for the first time to our knowledge, an increase of the photosensitivity of a microstructured polymer optical fibre (mPOF) made of undoped PMMA due to applied strain during the fabrication of the gratings. In the work, fibre Bragg gratings (FBGs) have been fabricated in undoped PMMA mPOFs with a hexagonal structure of three rings in the inner cladding. Two sets of FBGs were inscribed at two different resonant wavelengths (827 nm and 1562 nm) at different strains using an UV He-Cd laser at 325 nm focused by a lens and scanned over the fibre. We observed an increase of the reflection of the fibre Bragg gratings when the fabrication strain is higher. The photosensitivity mechanism is discussed in the paper along with the chemical reactions that could underlie the mechanism. Furthermore, the resolution limit of the material was investigated.

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D. Sáez-Rodríguez, K. Nielsen, O. Bang, and D. J. Webb "Increase of the photosensitivity of undoped poly(methylmethacrylate) under UV radiation at 325 nm", Proc. SPIE 9128, Micro-structured and Specialty Optical Fibres III, 91280P (2 May 2014); https://doi.org/10.1117/12.2054297

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