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In-situ doping of Tb3+ ions in silicon oxides and oxynitrides deposited by electron-cyclotron-resonance plasma enhanced chemical-vapour (ECR-PECVD) has been performed. Oxygen and nitrogen gas flow rates were changed to produce a gradual substitution of oxygen by nitrogen in the host matrix. Bright green luminescence from as-deposited layers is observed by the naked eye under daylight conditions. Tbdoped nitrogen-rich samples showed a considerable photoluminescence (PL) enhancement compared to Tb-doped silicon oxides. An optimum layer composition for efficient Tb3+ excitation under non-resonant optical pumping is obtained. The combination of a low temperature treatment with bright luminescence could be instrumental for the development of light emitting devices in other platforms with more restrictive temperature requirements.
J. M. Ramírez,J. Wojcik,Y. Berencén,P. Mascher, andB. Garrido
"On the photoluminescence of as-deposited Tb-doped silicon oxides and oxynitrides fabricated by ECR-PECVD ", Proc. SPIE 9133, Silicon Photonics and Photonic Integrated Circuits IV, 913309 (1 May 2014); https://doi.org/10.1117/12.2052571
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J. M. Ramírez, J. Wojcik, Y. Berencén, P. Mascher, B. Garrido , "On the photoluminescence of as-deposited Tb-doped silicon oxides and oxynitrides fabricated by ECR-PECVD ," Proc. SPIE 9133, Silicon Photonics and Photonic Integrated Circuits IV, 913309 (1 May 2014); https://doi.org/10.1117/12.2052571