Application of lower aliphatic alcohols as reducing agents for increasing efficiency of the LCLD process

Dmitrii Semenok

doi:10.1117/12.2049576

1 May 2014 Application of lower aliphatic alcohols as reducing agents for increasing efficiency of the LCLD process

Dmitrii Semenok

Proceedings Volume 9135, Laser Sources and Applications II; 91350X (2014) https://doi.org/10.1117/12.2049576
Event: SPIE Photonics Europe, 2014, Brussels, Belgium

Abstract

A method is described that is promising for application metal conductors on ceramic substrates during printed-circuit boards (PCBs) production without masking plate. The main idea of laser-induced metal deposition from solution (LCLD) consists of implementation of chemical micro reactor by using a focused laser beam. In this reactor the red/ox reaction would be initiated due to heating of a reaction medium. We used a 532 nm DPSS laser (power: 2100 mW) and water solutions of organic alcohols with low molecular weight, ethanol and isopropanol as reductants. The results of deposition were studied using the SEM, EDX methods and impedance spectroscopy. The equivalent resistance-capacitance circuit of copper tracks was constructed. The experiments showed that increasing the rate of deposition of nanostructured copper tracks up to 50 μm/s with electrical resistivity 5 Ohm/cm is possible by replacing the well-known reductants such as formaldehyde and D-sorbitol with iso-propanol.

Citation Download Citation

Dmitrii Semenok "Application of lower aliphatic alcohols as reducing agents for increasing efficiency of the LCLD process", Proc. SPIE 9135, Laser Sources and Applications II, 91350X (1 May 2014); https://doi.org/10.1117/12.2049576

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