Optical nanogap matrices for plasmonic enhancement applications

Stephen J. Bauman; Desalegn T. Debu; Avery M. Hill; Eric C. Novak; Douglas Natelson; Joseph B. Herzog

doi:10.1117/12.2061899

10 September 2014 Optical nanogap matrices for plasmonic enhancement applications

Stephen J. Bauman, Desalegn T. Debu, Avery M. Hill, Eric C. Novak, Douglas Natelson, Joseph B. Herzog

Proceedings Volume 9163, Plasmonics: Metallic Nanostructures and Their Optical Properties XII; 91631A (2014) https://doi.org/10.1117/12.2061899
Event: SPIE NanoScience + Engineering, 2014, San Diego, California, United States

Abstract

Plasmonic structures can be used to enhance electromagnetic radiation, and nanoscale (<5 nm) gaps can increase this enhancement even further. Fabrication of these desired structures involves using a relatively new, previously developed self-aligned process to overcome typical electron beam lithography resolution limits. The resulting nanogap structures have been shown to exhibit enhanced optical emission. This technique enables the fabrication of a large-area two-dimensional matrix of such nanostructures which could prove useful for photovoltaics, plasmonically enhanced Raman spectroscopy, biosensing, and other optoelectronic applications. Computational electromagnetic simulations of the structures will prove useful for predicting behavior upon interaction with light and for experimental comparison.

Citation Download Citation

Stephen J. Bauman, Desalegn T. Debu, Avery M. Hill, Eric C. Novak, Douglas Natelson, and Joseph B. Herzog "Optical nanogap matrices for plasmonic enhancement applications", Proc. SPIE 9163, Plasmonics: Metallic Nanostructures and Their Optical Properties XII, 91631A (10 September 2014); https://doi.org/10.1117/12.2061899

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