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10 September 2014 Plasmonic nanostructuring through direct laser interference patterning
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Direct writing of plasmonic nanostructures is demonstrated by nanoscale-tensile-stress induced patterning through interference crosslinking in a polymer film and by single-pulse interference ablation of a gold film. Nanoscale-tensilestress from the interference crosslinking of polymer films which are exposed to the interference pattern of UV laser beams stretches evaporated gold films and induces pattern transfer from polymer into gold nanostructures. Instead, plasmonic nanostructures can be directly patterned by the interference ablation. Being exposed to the interference pattern of an UV laser pulse, the gold is directly removed within the bright interference fringes, producing periodically arranged plasmonic nanostructures.
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Yuanhai Lin, Tianrui Zhai, and Xinping Zhang "Plasmonic nanostructuring through direct laser interference patterning", Proc. SPIE 9163, Plasmonics: Metallic Nanostructures and Their Optical Properties XII, 91631G (10 September 2014);

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