Mechanical behavior of microelectromechanical microshutters

Devin E. Burns; Justin S. Jones; Mary J. Li

doi:10.1117/12.2060449

28 August 2014 Mechanical behavior of microelectromechanical microshutters

Devin E. Burns, Justin S. Jones, Mary J. Li

Proceedings Volume 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI; 917009 (2014) https://doi.org/10.1117/12.2060449
Event: SPIE NanoScience + Engineering, 2014, San Diego, California, United States

Abstract

A custom micro-mechanical test system was constructed using off-the-shelf components to characterize the mechanical properties of microshutters. Microshutters are rectangular microelectromechanical apertures which open and close about a narrow torsion bar hinge. Displacement measurements were verified using both capacitive and digital image correlation techniques. Repeatable experiments on Si₃N₄ cantilever beams verified that the test system operates consistently. Using beam theory, the modulus of elasticity of the low stress Si₃N₄ was approximately 150 GPa, though significant uncertainty exists for this measurement due primarily to imprecise knowledge of the cantilever thickness. Tests conducted on microshutter arrays concluded that reducing the Si₃N₄ thickness from 250 nm to 500 nm reduces the torsional stiffness by a factor of approximately four. This is in good agreement with analytical and finite element models of the microshutters.

Citation Download Citation

Devin E. Burns, Justin S. Jones, and Mary J. Li "Mechanical behavior of microelectromechanical microshutters", Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 917009 (28 August 2014); https://doi.org/10.1117/12.2060449

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