Nanoimprint fabrication of wiregrids micro-polarizers in near infrared spectra using SU-8 as an intermediate film

Junxin Wang; Andrew M. Sarangan

doi:10.1117/12.2061230

28 August 2014 Nanoimprint fabrication of wiregrids micro-polarizers in near infrared spectra using SU-8 as an intermediate film

Junxin Wang, Andrew M. Sarangan

Author Affiliations +

Proceedings Volume 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI; 917010 (2014) https://doi.org/10.1117/12.2061230
Event: SPIE NanoScience + Engineering, 2014, San Diego, California, United States

Abstract

In this paper, we demonstrate a wiregrid polarizer for the near-IR spectrum fabricated by nanoimprint techniques. High resolution grating structures with 215nm in linewidth, 375nm pitch and 235nm total height were patterned on silicon by deep-UV interference lithography followed by reactive ion etching. The grating structures were transferred to a SU-8 thin film by nanoimprint. Then a glancing angle deposition was performed to build the wiregrids. The extinction ratio was measured to be over 90:1 at 1064nm.

Citation Download Citation

Junxin Wang and Andrew M. Sarangan "Nanoimprint fabrication of wiregrids micro-polarizers in near infrared spectra using SU-8 as an intermediate film", Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 917010 (28 August 2014); https://doi.org/10.1117/12.2061230

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