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1 January 1988 Computerized Wavelength Stabilized 248.4 Nm Excimer Laser For Stepper
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Abstract
A single stage excimer laser for UV microlithography has been developed. It emits 2 Watt average power at about 248.4 nm with a bandwidth of 0.5 cm -1. A novel computer-controlled feedback circuitry provides for automatic stabilization of both average power and integrated bandwidth. In addition, a computer-controlled frequency stabilization unit makes that new laser ready for industrial use as light source in deep UV microlithography.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. Ruckle, P. Lokai, H. Rosenkranz, B. Nikolaus, H. J. Kahlert, B. Burghardt, D. Basting, and W. Muckenheim "Computerized Wavelength Stabilized 248.4 Nm Excimer Laser For Stepper", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968444
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