The Future Of Projection Lenses And The New G-Line Lens For 0.7 Âµm Lithography

Masakatsu Ohta; Toshiyuki Kojima; Chiaki Sato; Tohru Ogawa; Miyoko Noguchi

doi:10.1117/12.968426

1 January 1988 The Future Of Projection Lenses And The New G-Line Lens For 0.7 µm Lithography

Masakatsu Ohta, Toshiyuki Kojima, Chiaki Sato, Tohru Ogawa, Miyoko Noguchi

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968426
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

This paper describes the development of g-line projection lenses as shown by an investigation of the decreasing value of focus depth due to lens production errors. It presents a study of the decreasing value and forecasts what the depth of focus will be for each linewidth in optical lithography in the next several years. Next we report the image performance of a new lens with a high numerical aperture that has been developed recently. This is the 5x reduction lens with a field size of 15 mm square (21.2 mm diameter) and a numerical aperture that is switchable between 0.48 and 0.43. The practical resolution is 0.7 μm and distortion is less than 0.1 μm over the image field. The depth of focus is in the range of 1.5 μm. In addition, we report the potential of this lens for achieving a resolution of less than 0.6 μm.

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Masakatsu Ohta, Toshiyuki Kojima, Chiaki Sato, Tohru Ogawa, and Miyoko Noguchi "The Future Of Projection Lenses And The New G-Line Lens For 0.7 µm Lithography", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968426

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KEYWORDS

Lenses

Distortion

Excimers

Monochromatic aberrations

Optical lithography

Image resolution

Lens design

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