Trends in mask data preparation

Aki Fujimura; Liyong Pang; Bo Su; Yohan Choi

doi:10.1117/12.2073368

8 October 2014 Trends in mask data preparation

Aki Fujimura, Liyong Pang, Bo Su, Yohan Choi

Author Affiliations +

Proceedings Volume 9235, Photomask Technology 2014; 923508 (2014) https://doi.org/10.1117/12.2073368
Event: SPIE Photomask Technology, 2014, Monterey, California, United States

Abstract

Whether for VSB mask writing or for multibeam mask writing, the shapes we need to write on masks are increasingly complex, increasingly curvilinear, and smaller in minimum width and space. The overwhelming trend in mask data preparation (MDP) is the shift from deterministic, rule-based, geometric, context-independent, shape-modulated, rectangular processing to statistical, simulation-based, context-dependent, dose- and shape-modulated any-shape processing. The paper briefly surveys the history of MDP, and explains through a simulation-based study that 50nm line and space is the tipping point where rule-based processing gives away to simulation-based processing.

Citation Download Citation

Aki Fujimura, Liyong Pang, Bo Su, and Yohan Choi "Trends in mask data preparation", Proc. SPIE 9235, Photomask Technology 2014, 923508 (8 October 2014); https://doi.org/10.1117/12.2073368

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