A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

Markus P. Benk; Ryan H. Miyakawa; Weilun Chao; Yow-Gwo Wang; Antoine Wojdyla; David G. Johnson; Alexander P. Donoghue; Kenneth A. Goldberg

doi:10.1117/12.2065513

8 October 2014 A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope

Markus P. Benk, Ryan H. Miyakawa, Weilun Chao, Yow-Gwo Wang, Antoine Wojdyla, David G. Johnson, Alexander P. Donoghue, Kenneth A. Goldberg

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Proceedings Volume 9235, Photomask Technology 2014; 92350K (2014) https://doi.org/10.1117/12.2065513
Event: SPIE Photomask Technology, 2014, Monterey, California, United States

Abstract

The authors are expanding the capabilities of the SHARP microscope by implementing complementary imaging modes. SHARP (the SEMATECH High-NA Actinic Reticle review Project) is an actinic, synchrotron-based microscope dedicated to extreme ultraviolet (EUV) photomask research. SHARP’s programmable Fourier Synthesis Illuminator and its use of Fresnel zoneplate lenses as imaging optics provide a versatile framework, facilitating the implementation of diverse modes beyond conventional imaging. In addition to SHARP’s set of standard zoneplates, we have created more than 100 zoneplates for complementary imaging modes, all designed to extract additional information from photomasks, improve navigation and enhance defect detection. More than 50 new zoneplates are installed in the tool; the remaining lenses are currently in production. In this paper we discuss the design and fabrication of zoneplates for complementary imaging modes and present image data, obtained using Zernike Phase Contrast and different implementations of Differential Interference Contrast.

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Markus P. Benk, Ryan H. Miyakawa, Weilun Chao, Yow-Gwo Wang, Antoine Wojdyla, David G. Johnson, Alexander P. Donoghue, and Kenneth A. Goldberg "A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope", Proc. SPIE 9235, Photomask Technology 2014, 92350K (8 October 2014); https://doi.org/10.1117/12.2065513

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KEYWORDS

Phase contrast

Digital image correlation

Microscopes

Photomasks

Extreme ultraviolet

Silicon

Lenses

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