AIMS EUV first light imaging performance

Anthony Garetto; Renzo Capelli; Krister Magnusson; Jan Hendrik Peters; Sascha Perlitz; Ulrich Matejka; Dirk Hellweg; Markus Weiss; Michael Goldstein

doi:10.1117/12.2068308

29 October 2014 AIMS EUV first light imaging performance

Anthony Garetto, Renzo Capelli, Krister Magnusson, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus Weiss, Michael Goldstein

Author Affiliations +

Proceedings Volume 9235, Photomask Technology 2014; 92350N (2014) https://doi.org/10.1117/12.2068308
Event: SPIE Photomask Technology, 2014, Monterey, California, United States

Abstract

Overcoming the challenges associated with photomask defectivity is one of the key aspects associated with EUV mask infrastructure. In addition to establishing specific EUV mask repair approaches, the ability to identify printable mask defects that require repair as well as to verify if a repair was successful are absolutely necessary. Such verification can only be performed by studying the repaired region using actinic light at an exact emulation of the scanner illumination conditions of the mask as can be done by the AIMS^TM EUV. ZEISS, in collaboration with the SEMATECH EUVL Mask Infrastructure (EMI) consortium are currently developing the AIMS^TM EUV system and have recently achieved First Light on the prototype system, a major achievement. First light results will be presented in addition to the current development status of the system.

Citation Download Citation

Anthony Garetto, Renzo Capelli, Krister Magnusson, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus Weiss, and Michael Goldstein "AIMS EUV first light imaging performance", Proc. SPIE 9235, Photomask Technology 2014, 92350N (29 October 2014); https://doi.org/10.1117/12.2068308

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