Paper
31 October 2014 Thin films characterizations to design high-reflective coatings for ultrafast high power laser systems
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Abstract
Dielectrics as single layers and broadband high-reflective stacks were deposited by electron beam deposition processes compatible with 1-meter class optics. After being physically and optically characterized, samples were irradiated with several ultrafast lasers (KYW:Yb 500fs, Ti:Sa 40fs and Ti:Sa 11fs) with single and multi-pulses. The setups of the test platforms, laser-induced damage threshold investigations of intrinsic materials, dielectric multilayers and hybrid metal/dielectric multilayers and electric field intensity distributions are described.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adrien Hervy, Laurent Gallais, Daniel Mouricaud, Gilles Chériaux, Olivier Utéza, Raphael Clady, Marc Sentis, and Antoine Fréneaux "Thin films characterizations to design high-reflective coatings for ultrafast high power laser systems", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92370J (31 October 2014); https://doi.org/10.1117/12.2068047
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Cited by 2 scholarly publications.
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KEYWORDS
Laser induced damage

Thin film coatings

Dielectrics

Multilayers

Optical coatings

Laser damage threshold

Refractive index

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