Characterization of HfO2-SiO2 rugate multilayers deposited by ion beam sputtering

R. Rauhut; K. Nehls; L. Mechold

doi:10.1117/12.2068193

31 October 2014 Characterization of HfO₂-SiO₂ rugate multilayers deposited by ion beam sputtering

R. Rauhut, K. Nehls, L. Mechold

Author Affiliations +

Proceedings Volume 9237, Laser-Induced Damage in Optical Materials: 2014; 92370O (2014) https://doi.org/10.1117/12.2068193
Event: SPIE Laser Damage, 2014, Boulder, Colorado, United States

Abstract

Ion beam sputtering (IBS) is a deposition technique being well known for resulting in very dense and damage resistant coatings due to high kinetic energies of the sputtered atoms. While different layers are deposited homogeneously, abrupt interfaces between the materials are the most susceptible part of the stack. Therefore we aim for an improvement of the laser damage threshold by sputtering material mixtures. Using a target with high- and low-index material next to each other, arbitrary refractive indices can be realized by adjusting the target axis. Our material system of choice is HfO₂- SiO₂, already yielding good results with non-rugate coatings. A comparison in terms of laser damage threshold between these designs and varying refractive index coatings will be shown.

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R. Rauhut, K. Nehls, and L. Mechold "Characterization of HfO₂-SiO₂ rugate multilayers deposited by ion beam sputtering", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92370O (31 October 2014); https://doi.org/10.1117/12.2068193

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