Comprehensive studies of IR to UV light intensification by nodular defects in HfO2/SiO2 multilayer mirrors

Linas Smalakys; Gintarė Batavičiūtė; Egidijus Pupka; Andrius Melninkaitis

doi:10.1117/12.2068310

31 October 2014 Comprehensive studies of IR to UV light intensification by nodular defects in HfO₂/SiO₂ multilayer mirrors

Linas Smalakys, Gintarė Batavičiūtė, Egidijus Pupka, Andrius Melninkaitis

Author Affiliations +

Proceedings Volume 9237, Laser-Induced Damage in Optical Materials: 2014; 92371I (2014) https://doi.org/10.1117/12.2068310
Event: SPIE Laser Damage, 2014, Boulder, Colorado, United States

Abstract

Nodular defects tend to limit laser-induced damage threshold (LIDT) of multilayer dielectric coatings frequently used for laser applications. Cross-sections of localized damage morphologies correlate well with light intensifi- cation patterns caused by defect geometries. In vast majority of studies electric field enhancement in nodular defects was investigated for infrared spectral region. In this work theoretical analysis has been extended for IR - UV range. Light intensification in HfO₂/SiO₂ multilayer mirror coating was studied numerically. The analysis of obtained results indicates that phenomena is very sensitive to almost every investigated parameter. It was also found that field enhancement eﬀect can be reached within distinct material layers (either of low or high refractive index). The discussion and insights complementing existing knowledge on nodular defects were made.

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Linas Smalakys, Gintarė Batavičiūtė, Egidijus Pupka, and Andrius Melninkaitis "Comprehensive studies of IR to UV light intensification by nodular defects in HfO₂/SiO₂ multilayer mirrors", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92371I (31 October 2014); https://doi.org/10.1117/12.2068310

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