In-situ laser-induced contamination monitoring using long-distance microscopy

Paul Wagner; Helmut Schröder; Wolfgang Riede

doi:10.1117/12.2066465

31 October 2014 In-situ laser-induced contamination monitoring using long-distance microscopy

Paul Wagner, Helmut Schröder, Wolfgang Riede

Proceedings Volume 9237, Laser-Induced Damage in Optical Materials: 2014; 92372B (2014) https://doi.org/10.1117/12.2066465
Event: SPIE Laser Damage, 2014, Boulder, Colorado, United States

Abstract

Operating high power space-based laser systems in the visible and UV range is problematic due to laser-induced contamination (LIC). In this paper LIC growth on high-reflective (HR) coated optics is investigated for UV irradiation of 355 nm with naphthalene as contamination material in the range of 10-5 mbar. The investigated HR optics were coated by different processes: electron beam deposition (EBD), magnetron sputtering (MS) or ion beam sputtering (IBS). In-situ observation of contamination induced damage was performed using a long distance microscope. Additionally the onset and evolution of deposit formation and contamination induced damage of optical samples was observed by in-situ laserinduced fluorescence and reflection monitoring. Ex-situ characterization of deposits and damage morphology was performed by differential interference contrast and fluorescence microscopy. It was found that contamination induced a drastic reduction of laser damage threshold compared to values obtained without contamination. Contamination deposit and damage formation was strongest on IBS followed by MS and smallest on EBD.

Citation Download Citation

Paul Wagner, Helmut Schröder, and Wolfgang Riede "In-situ laser-induced contamination monitoring using long-distance microscopy", Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 92372B (31 October 2014); https://doi.org/10.1117/12.2066465

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