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21 August 2014 Impact of the basal material on the deposition titanium nitride thin films
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Proceedings Volume 9285, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials for Manufacturing and Testing; 928507 (2014) https://doi.org/10.1117/12.2069017
Event: 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2014), 2014, Harbin, China
Abstract
Studied by dc reactive magnetron sputtering method, with Si - p and Si (111) - p (100), two different Si do base, affect the performance of TiNx thin film preparation. Results show that Si - of the preparation of p (111) as the basal TiNx film performance is better than that of Si - p (100), the performance in the particles more renew, more Octavia and XRD diffraction fengfeng shape with TiNx diffraction peak do not overlap. Therefore, choose p - Si (111) basal deposited titanium nitride thin films, can meet the requirements of the preparation of optical thin film quality.
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Shuying Fu and Hongliang Li "Impact of the basal material on the deposition titanium nitride thin films", Proc. SPIE 9285, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials for Manufacturing and Testing, 928507 (21 August 2014); https://doi.org/10.1117/12.2069017
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