Performance optimization of MOPA pre-pulse LPP light source

Alexander A. Schafgans; Daniel J. Brown; Igor V. Fomenkov; Rick Sandstrom; Alex Ershov; Georgiy Vaschenko; Rob Rafac; Michael Purvis; Slava Rokitski; Yezheng Tao; Daniel J. Riggs; Wayne J. Dunstan; Matthew Graham; Nigel R. Farrar; David C. Brandt; Norbert Böwering; Alberto Pirati; Noreen Harned; Christian Wagner; Hans Meiling; Ron Kool

doi:10.1117/12.2087421

16 March 2015 Performance optimization of MOPA pre-pulse LPP light source

Alexander A. Schafgans, Daniel J. Brown, Igor V. Fomenkov, Rick Sandstrom, Alex Ershov, Georgiy Vaschenko, Rob Rafac, Michael Purvis, Slava Rokitski, Yezheng Tao, Daniel J. Riggs, Wayne J. Dunstan, Matthew Graham, Nigel R. Farrar, David C. Brandt, Norbert Böwering, Alberto Pirati, Noreen Harned, Christian Wagner, Hans Meiling, Ron Kool

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94220B (2015) https://doi.org/10.1117/12.2087421
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the most recent results from high power sources in the field and testing on our laboratory based development systems, and describe the requirements and technical challenges related to successful implementation of those technologies on production sources. System performance is shown, focusing on pre-pulse operation with high conversion efficiency (CE) and with dose control to ensure high die yield. Finally, experimental results evaluating technologies for generating stable EUV power output for a high volume manufacturing (HVM) LPP source will be reviewed.

Citation Download Citation

Alexander A. Schafgans, Daniel J. Brown, Igor V. Fomenkov, Rick Sandstrom, Alex Ershov, Georgiy Vaschenko, Rob Rafac, Michael Purvis, Slava Rokitski, Yezheng Tao, Daniel J. Riggs, Wayne J. Dunstan, Matthew Graham, Nigel R. Farrar, David C. Brandt, Norbert Böwering, Alberto Pirati, Noreen Harned, Christian Wagner, Hans Meiling, and Ron Kool "Performance optimization of MOPA pre-pulse LPP light source", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220B (16 March 2015); https://doi.org/10.1117/12.2087421

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