Performance of one hundred watt HVM LPP-EUV source

Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Krzysztof M Nowak; Yasufumi Kawasuji; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Takeshi Kodama; Yutaka Shiraishi; Tatsuya Yanagida; Georg Soumagne; Tsuyoshi Yamada; Taku Yamazaki; Shinji Okazaki; Takashi Saitou

doi:10.1117/12.2086347

13 March 2015 Performance of one hundred watt HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof M Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94220C (2015) https://doi.org/10.1117/12.2086347
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

We have been developing CO₂-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL. Unique and original technologies such as: combination of pulsed CO₂ laser and Sn droplets, dual wavelength laser pulses shooting, and mitigation with magnetic field, have been developed in Gigaphoton Inc. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. Based on these data we are developing first practical source for HVM - “GL200E”. This data means 250W EUV power will be able to realize around 20kW level pulsed CO₂ laser. We have reported engineering data from our recent test such around 43W average clean power, CE=2.0%, with 100kHz operation and other data¹⁹⁾. We have already finished preparation of higher average power CO₂ laser more than 20kW at output power cooperate with Mitsubishi Electric Corporation ¹⁴⁾. Recently we achieved 92W with 50kHz, 50% duty cycle operation²⁰⁾. We have reported component technology progress of EUV light source system.

We report promising experimental data and result of simulation of magnetic mitigation system in Proto #1 system. We demonstrated several data with Proto #2 system: (1) emission data of 140W in burst under 70kHz 50% duty cycle during 10 minutes. (2) emission data of 118W in burst under 60kHz 70% duty cycle during 10 minutes. (3) emission data of 42W in burst under 20kHz 50% duty cycle (10000pls/0.5ms OFF) during 3 hours (110Mpls). Also we report construction of Pilot #1 system. Final target is week level operation with 250W EUV power with CE=4%, more than 27kW CO₂ laser power by the end of Q2 of 2015.

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Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof M Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, and Takashi Saitou "Performance of one hundred watt HVM LPP-EUV source", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94220C (13 March 2015); https://doi.org/10.1117/12.2086347

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