Advanced coatings for next generation lithography

P. Naujok; Sergiy Yulin; N. Kaiser; A. Tünnermann

doi:10.1117/12.2085764

13 March 2015 Advanced coatings for next generation lithography

P. Naujok, Sergiy Yulin, N. Kaiser, A. Tünnermann

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94221K (2015) https://doi.org/10.1117/12.2085764
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To implement B-based mirrors and to enable their industrial application in lithography tools, a reflectivity level of > 70% has to be reached in near future. The authors will prove that transition from conventional La/B₄C to promising LaN/B₄C multilayer coatings leads to enhanced optical properties. Currently a near normal-incidence reflectivity of 58.1% @ 6.65 nm is achieved by LaN/B₄C multilayer mirrors. The introduction of ultrathin diffusion barriers into the multilayer design to reach the targeted reflectivity of 70% was also tested. The optimization of multilayer design and deposition process for interface-engineered La/C/B₄C multilayer mirrors resulted in peak reflectivity of 56.8% at the wavelength of 6.66 nm. In addition, the thermal stability of several selected multilayers was investigated and will be discussed.

Citation Download Citation

P. Naujok, Sergiy Yulin, N. Kaiser, and A. Tünnermann "Advanced coatings for next generation lithography", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221K (13 March 2015); https://doi.org/10.1117/12.2085764

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