An accurate method to determine the amount of out-of-band light in an EUV scanner

Shinn-Sheng Yu; Yen-Cheng Lu; Chih-Tsung Shih; Chia-Chun Chung; Shang-Chieh Chien; Shun-Der Wu; Norman Chen; Shu-Hao Chang; Hsiang-Yu Chou; Jui-Ching Wu; Tao-Ming Huang; Jack J. H. Chen; Anthony Yen

doi:10.1117/12.2085089

19 March 2015 An accurate method to determine the amount of out-of-band light in an EUV scanner

Shinn-Sheng Yu, Yen-Cheng Lu, Chih-Tsung Shih, Chia-Chun Chung, Shang-Chieh Chien, Shun-Der Wu, Norman Chen, Shu-Hao Chang, Hsiang-Yu Chou, Jui-Ching Wu, Tao-Ming Huang, Jack J. H. Chen, Anthony Yen

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94221T (2015) https://doi.org/10.1117/12.2085089
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

In this paper, we proposed a new design of the test mask to measure the amount of the out-of-band (OOB) light from an extreme-ultraviolet (EUV) light source by detuning the period of the multilayer (ML), rather than changing the material of the absorber, to suppress reflection of EUV light. The new OOB test mask also reflects essentially the same OOB light as that of the production mask at each wavelength in the whole OOB spectral range. With the help of the new OOB test mask, the contributions to the background intensity from in-band flare and OOB light can be correctly separated and an accurate optical-proximity-correction (OPC) model can be established.

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Shinn-Sheng Yu, Yen-Cheng Lu, Chih-Tsung Shih, Chia-Chun Chung, Shang-Chieh Chien, Shun-Der Wu, Norman Chen, Shu-Hao Chang, Hsiang-Yu Chou, Jui-Ching Wu, Tao-Ming Huang, Jack J. H. Chen, and Anthony Yen "An accurate method to determine the amount of out-of-band light in an EUV scanner", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221T (19 March 2015); https://doi.org/10.1117/12.2085089

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