In order to meet the increasing demand for resolution and throughput of CD-metrology, defect inspection and review, TNO has previously introduced the parallel SPM concept, consisting of parallel operation of many miniaturized SPMs on a 300 and 450 mm wafer. In this paper we will present the proof of principle of the parallelization for metrology and inspection. To give an indication of the system’s specifications, the throughput of scanning is 4500 sites per hour, each within an area of 1 μm2 and 1024 ×1024 pixels.
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