3D isolation mounts scatterometry with RCWA and PML

Hirokimi Shirasaki

doi:10.1117/12.2085660

19 March 2015 3D isolation mounts scatterometry with RCWA and PML

Hirokimi Shirasaki

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 942421 (2015) https://doi.org/10.1117/12.2085660
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

In this paper, we examine the sensitivity of scatterometry for the 3D isolation mounts on the substrate by applying PML in RCWA. We analyze the reflectance from the silicon and resist single mount and the silicon double mounts on the silicon substrate. First, we investigate the beam width dependences of reflectance. Second, we show the propagation properties of the electromagnetic fields propagating for the isolation mounts on the silicon substrate. Third, we show the reflectance properties by changing the mount length and width on the Si substrate. Finally, we examine the wavelength properties of reflectance calculated by changing the mount length, width and height for single mount and the silicon mount positions for the double silicon mounts. Then, we understand the scatterometry observation is possible in several microns beam width.

Citation Download Citation

Hirokimi Shirasaki "3D isolation mounts scatterometry with RCWA and PML", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942421 (19 March 2015); https://doi.org/10.1117/12.2085660

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