Inverse lithography using sparse mask representations

Radu C. Ionescu; Paul Hurley; Stefan Apostol

doi:10.1117/12.2085762

18 March 2015 Inverse lithography using sparse mask representations

Radu C. Ionescu, Paul Hurley, Stefan Apostol

Proceedings Volume 9426, Optical Microlithography XXVIII; 94260K (2015) https://doi.org/10.1117/12.2085762
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

We present a novel optimisation algorithm for inverse lithography, based on optimization of the mask derivative, a domain inherently sparse, and for rectilinear polygons, invertible. The method is first developed assuming a point light source, and then extended to general incoherent sources. What results is a fast algorithm, producing manufacturable masks (the search space is constrained to rectilinear polygons), and flexible (specific constraints such as minimal line widths can be imposed). One inherent trick is to treat polygons as continuous entities, thus making aerial image calculation extremely fast and accurate. Requirements for mask manufacturability can be integrated in the optimization without too much added complexity. We also explain how to extend the scheme for phase-changing mask optimization.

Citation Download Citation

Radu C. Ionescu, Paul Hurley, and Stefan Apostol "Inverse lithography using sparse mask representations", Proc. SPIE 9426, Optical Microlithography XXVIII, 94260K (18 March 2015); https://doi.org/10.1117/12.2085762

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