Forbidden pitches: causes, source optimization, and their role in design rules

Ştefan Apostol; Paul Hurley

doi:10.1117/12.2085753

18 March 2015 Forbidden pitches: causes, source optimization, and their role in design rules

Ştefan Apostol, Paul Hurley

Proceedings Volume 9426, Optical Microlithography XXVIII; 94261K (2015) https://doi.org/10.1117/12.2085753
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Forbidden pitches are the result of unwanted, non-linear effects that limit yield and not always well understood. Yet, as approximations, they are implicitly deployed through design rules. Many believe they result as a consequence of more complicated light sources. We develop an analytical model of aerial image quality as a function of light source. We show the effect is most pronounced for a point light source, the simplest of all. We develop a method to improve print image quality by illumination source optimization, and show promising first results. Additionally, it is shown how design rules capture forbidden pitches unsatisfactorily.

Citation Download Citation

Ştefan Apostol and Paul Hurley "Forbidden pitches: causes, source optimization, and their role in design rules", Proc. SPIE 9426, Optical Microlithography XXVIII, 94261K (18 March 2015); https://doi.org/10.1117/12.2085753

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