Performance of ETC controller in high-volume production

Joshua Thornes; Kevin O'Brien; Hoang Dao; David Dunlap; Ronnie Flores; Matt Lake; Aleks Simic; Brian Wehrung; John Wyman; Will Conley

doi:10.1117/12.2086102

18 March 2015 Performance of ETC controller in high-volume production

Joshua Thornes, Kevin O'Brien, Hoang Dao, David Dunlap, Ronnie Flores, Matt Lake, Aleks Simic, Brian Wehrung, John Wyman, Will Conley

Author Affiliations +

Proceedings Volume 9426, Optical Microlithography XXVIII; 942625 (2015) https://doi.org/10.1117/12.2086102
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost of ownership. In particular, the ETC controller provides improved spectral bandwidth and wavelength stability, which enables superior CD control and wafer yield for the chipmaker. This controller is a key technology in Cymer’s XLR 700ix and DynaPulse^TM products. Last year we reported that the XLR 600ix incorporates new controller technology called ETC for improvements in spectral bandwidth and wavelength stability. The Authors will present metrics demonstrating the performance and stability of systems that have been installed at chipmaker sites over the last year.

Citation Download Citation

Joshua Thornes, Kevin O'Brien, Hoang Dao, David Dunlap, Ronnie Flores, Matt Lake, Aleks Simic, Brian Wehrung, John Wyman, and Will Conley "Performance of ETC controller in high-volume production", Proc. SPIE 9426, Optical Microlithography XXVIII, 942625 (18 March 2015); https://doi.org/10.1117/12.2086102

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