A pattern-based methodology for optimizing stitches in double-patterning technology

Lynn T.-N. Wang; Sriram Madhavan; Vito Dai; Luigi Capodieci

doi:10.1117/12.2085955

18 March 2015 A pattern-based methodology for optimizing stitches in double-patterning technology

Lynn T.-N. Wang, Sriram Madhavan, Vito Dai, Luigi Capodieci

Proceedings Volume 9427, Design-Process-Technology Co-optimization for Manufacturability IX; 942704 (2015) https://doi.org/10.1117/12.2085955
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

A pattern-based methodology for optimizing stitches is developed based on identifying stitch topologies and replacing them with pre-characterized fixing solutions in decomposed layouts. A topology-based library of stitches with predetermined fixing solutions is built. A pattern-based engine searches for matching topologies in the decomposed layouts. When a match is found, the engine opportunistically replaces the predetermined fixing solution: only a design rule check error-free replacement is preserved. The methodology is demonstrated on a 20nm layout design that contains over 67 million, first metal layer stitches. Results show that a small library containing 3 stitch topologies improves the stitch area regularity by 4x.

Citation Download Citation

Lynn T.-N. Wang, Sriram Madhavan, Vito Dai, and Luigi Capodieci "A pattern-based methodology for optimizing stitches in double-patterning technology", Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 942704 (18 March 2015); https://doi.org/10.1117/12.2085955

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